雜志介紹

Plasma Sources Science & Technology雜志介紹

《Plasma Sources Science & Technology》是一本以English為主的未開(kāi)放獲取國(guó)際優(yōu)秀期刊，中文名稱(chēng)等離子源科技，本刊主要出版、報(bào)道物理與天體物理-PHYSICS, FLUIDS & PLASMAS領(lǐng)域的研究動(dòng)態(tài)以及在該領(lǐng)域取得的各方面的經(jīng)驗(yàn)和科研成果，介紹該領(lǐng)域有關(guān)本專(zhuān)業(yè)的最新進(jìn)展，探討行業(yè)發(fā)展的思路和方法，以促進(jìn)學(xué)術(shù)信息交流，提高行業(yè)發(fā)展。該刊已被國(guó)際權(quán)威數(shù)據(jù)庫(kù)SCIE收錄，為該領(lǐng)域相關(guān)學(xué)科的發(fā)展起到了良好的推動(dòng)作用，也得到了本專(zhuān)業(yè)人員的廣泛認(rèn)可。該刊最新影響因子為3.3，最新CiteScore 指數(shù)為7.1。

本刊近期中國(guó)學(xué)者發(fā)表的論文主要有：

• Self-consistent treatment of gas heating in modeling of a coaxial DBD in atmospheric pressure CO2

  Author: Zhou, Chen; Yuan, Chengxun; Kudryavtsev, Anatoly; Yasar Katircioglu, T.; Rafatov, Ismail; Yao, Jingfeng

• Streamer dynamics and periodical discharge regime transitions under repetitive nanosecond pulses with airflow

  Author: Zhao, Zheng; Li, Chenjie; Guo, Yulin; Zheng, Xinlei; Sun, Anbang; Li, Jiangtao

• Numerical simulation of gas breakdown characteristics in porous dielectric and theoretical analysis based on the capillary network model

  Author: Chen, Kai; Yao, Chenguo; Mao, Yilong; Wu, Feiyu; Chen, Yue; Dong, Shoulong; Wang, Hao

• In situ probing of atmospheric-pressure warm air glow discharge for nitrogen fixation by multiple laser spectroscopies

  Author: Shu, Zhan; Qiao, Junjie; Yang, Qi; Song, Yijia; Wang, Dazhi; Xiong, Qing

英文介紹

Plasma Sources Science & Technology雜志英文介紹

Plasma Sources Science and Technology (PSST) reports on low-temperature plasmas and ionized gases operating over all ranges of gas pressure and plasma density, with varying degrees of ionization. The emphasis of PSST is on the fundamental science of these plasmas, their sources and the physical and chemical processes initiated or sustained by them, as elucidated through theoretical, computational or experimental techniques. PSST also reports on new experimentally or theoretically derived fundamental data (e.g. cross sections, transport coefficients) required for investigation of low temperature plasmas. Reports that relate to the technology and applications of these plasmas should be closely linked to the science and fundamental processes occurring in the plasma state.