雜志介紹

Plasma Chemistry And Plasma Processing雜志介紹

《Plasma Chemistry And Plasma Processing》是一本以English為主的未開放獲取國際優(yōu)秀期刊，中文名稱等離子化學和等離子處理，本刊主要出版、報道物理與天體物理-ENGINEERING, CHEMICAL領域的研究動態(tài)以及在該領域取得的各方面的經驗和科研成果，介紹該領域有關本專業(yè)的最新進展，探討行業(yè)發(fā)展的思路和方法，以促進學術信息交流，提高行業(yè)發(fā)展。該刊已被國際權威數(shù)據(jù)庫SCIE收錄，為該領域相關學科的發(fā)展起到了良好的推動作用，也得到了本專業(yè)人員的廣泛認可。該刊最新影響因子為2.6，最新CiteScore 指數(shù)為5.9。

本刊近期中國學者發(fā)表的論文主要有：

• Plasma-Catalytic Ammonia Decomposition for Carbon-Free Hydrogen Production Using Low Pressure-Synthesized Mo2N Catalyst

  Author: Yu, Xiuxia; Hu, Ke; Zhang, Huazhou; He, Ge; Xia, Yuanhua; Deng, Mao; Shi, Yang; Yang, Chi; Mao, Xinchun; Wang, Zhijun

• Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma

  Author: He, Yun-peng; Jin, Wei; Wang, Yi-bo; Lv, Shao-bo; Wang, Rui-sheng; Liu, Jun-qi; Liu, Hai-cheng

• Study on the Anticancer Effects of Plasma-Activated Saline Perfusion Based on a Microfluidic System

  Author: Zhang, Jishen; Xu, Shengduo; Jing, Xixi; Liu, Dingxin; Zhang, Hao; Wang, Zifeng; Xu, Dehui; Zhang, Geng; Yang, Xiaojian; Wang, Xiaohua; Kong, Michael G.; Rong, Mingzhe

• A RF plasma source with focused magnetic field for material treatment

  Author: Zhang, L. P.; Chang, L.; Yuan, X. G.; Zhang, J. H.; Zhou, H. S.; Luo, G. N.

英文介紹

Plasma Chemistry And Plasma Processing雜志英文介紹

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.