- 數(shù)據(jù)庫收錄SCIE
- 年發(fā)文量8
International Journal Of Rf Technologies-research And Applications
期刊中文名：國際射頻技術(shù)研究與應(yīng)用雜志ISSN：1754-5730E-ISSN：1754-5749
該雜志國際簡稱：INT J RF TECHNOL-RES，是由出版商IOS Press出版的一本致力于發(fā)布--研究新成果的的專業(yè)學術(shù)期刊。主要發(fā)表刊登有創(chuàng)見的學術(shù)論文文章、行業(yè)最新科研成果，扼要報道階段性研究成果和重要研究工作的最新進展，選載對學科發(fā)展起指導作用的綜述與專論，促進學術(shù)發(fā)展，為廣大讀者服務(wù)。該刊是一本國際優(yōu)秀雜志，在國際上有很高的學術(shù)影響力。
雜志介紹
International Journal Of Rf Technologies-research And Applications雜志介紹
《International Journal Of Rf Technologies-research And Applications》是一本以English為主的未開放獲取國際優(yōu)秀期刊，中文名稱國際射頻技術(shù)研究與應(yīng)用雜志，本刊主要出版、報道領(lǐng)域的研究動態(tài)以及在該領(lǐng)域取得的各方面的經(jīng)驗和科研成果，介紹該領(lǐng)域有關(guān)本專業(yè)的最新進展，探討行業(yè)發(fā)展的思路和方法，以促進學術(shù)信息交流，提高行業(yè)發(fā)展。該刊已被國際權(quán)威數(shù)據(jù)庫SCIE收錄，為該領(lǐng)域相關(guān)學科的發(fā)展起到了良好的推動作用，也得到了本專業(yè)人員的廣泛認可。該刊最新影響因子為1.6，最新CiteScore 指數(shù)為1.1。
英文介紹
International Journal Of Rf Technologies-research And Applications雜志英文介紹
The International Journal of Rf Technologies - Research And Applications is an academic journal dedicated to the field of RF technology. Intended to publish research results and application cases related to radio frequency technology, covering multiple disciplines and fields. Its content may involve theoretical research and technological innovation of radio frequency technology, as well as practical applications in communication, Internet of Things, wireless sensor networks, intelligent transportation, medical equipment, industrial automation, and other fields.
This journal provides a platform for researchers, engineers, scholars, and professionals in related fields to exchange and share RF technology knowledge and experience, which helps promote the development and innovation of RF technology, and facilitate its widespread application and practical implementation in various fields. Its readership usually includes experts, scholars, researchers, engineers, and enterprise R&D personnel in the field of RF technology. They pay attention to the latest developments in RF technology and hope to learn about the cutting-edge research results, application cases, and industry development trends in this field through this journal, in order to promote their own research work or practical application projects.
JCR分區(qū)（2023-2024年最新版）
International Journal Of Rf Technologies-research And Applications雜志 JCR分區(qū)信息
| 按JIF指標學科分區(qū) |
學科：COMPUTER SCIENCE, INFORMATION SYSTEMS
收錄子集：ESCI
分區(qū)：Q3
排名：168 / 249
百分位：
32.7% |
| 按JCI指標學科分區(qū) |
學科：COMPUTER SCIENCE, INFORMATION SYSTEMS
收錄子集：ESCI
分區(qū)：Q4
排名：246 / 251
百分位：
2.19% |
JCR分區(qū)：JCR分區(qū)來自科睿唯安公司,JCR是一個獨特的多學科期刊評價工具，為唯一提供基于引文數(shù)據(jù)的統(tǒng)計信息的期刊評價資源。每年發(fā)布的JCR分區(qū)，設(shè)置了254個具體學科。JCR分區(qū)根據(jù)每個學科分類按照期刊當年的影響因子高低將期刊平均分為4個區(qū)，分別為Q1、Q2、Q3和Q4，各占25%。JCR分區(qū)中期刊的數(shù)量是均勻分為四個部分的。
CiteScore 評價數(shù)據(jù)（2024年最新版）
International Journal Of Rf Technologies-research And Applications雜志CiteScore 評價數(shù)據(jù)
- CiteScore 值：1.1
- SJR：0.143
- SNIP：0.084
| 學科類別 | 分區(qū) | 排名 | 百分位 |
| 大類：Engineering 小類：Industrial and Manufacturing Engineering | Q3 | 275 / 384 |
28% |
| 大類：Engineering 小類：Electrical and Electronic Engineering | Q4 | 631 / 797 |
20% |
| 大類：Engineering 小類：Management of Technology and Innovation | Q4 | 239 / 289 |
17% |
| 大類：Engineering 小類：Management Information Systems | Q4 | 112 / 131 |
14% |
歷年影響因子和期刊自引率
投稿經(jīng)驗
International Journal Of Rf Technologies-research And Applications雜志投稿經(jīng)驗
該雜志是一本國際優(yōu)秀雜志，在國際上有較高的學術(shù)影響力，行業(yè)關(guān)注度很高，已被國際權(quán)威數(shù)據(jù)庫SCIE收錄，該雜志在綜合專業(yè)領(lǐng)域?qū)I(yè)度認可很高，對稿件內(nèi)容的創(chuàng)新性和學術(shù)性要求很高，作為一本國際優(yōu)秀雜志，一般投稿過審時間都較長，投稿過審時間平均 ，如果想投稿該刊要做好時間安排。版面費不祥。該雜志近兩年未被列入預警名單，建議您投稿。如您想了解更多投稿政策及投稿方案，請咨詢客服。
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