雜志介紹

Vacuum雜志介紹

《Vacuum》是一本以English為主的未開放獲取國際優(yōu)秀期刊，中文名稱真空，本刊主要出版、報道材料科學-PHYSICS, APPLIED領域的研究動態(tài)以及在該領域取得的各方面的經(jīng)驗和科研成果，介紹該領域有關本專業(yè)的最新進展，探討行業(yè)發(fā)展的思路和方法，以促進學術信息交流，提高行業(yè)發(fā)展。該刊已被國際權(quán)威數(shù)據(jù)庫SCIE收錄，為該領域相關學科的發(fā)展起到了良好的推動作用，也得到了本專業(yè)人員的廣泛認可。該刊最新影響因子為3.8，最新CiteScore 指數(shù)為6.8。

本刊近期中國學者發(fā)表的論文主要有：

• Effect of Ag content on friction and wear properties of TiCN/Ag films in different service environments

  Author: Zuo, Bin; Yu, Lihua; Xu, Junhua

• MOF seeding strategy for the fabrication of multi-metal oxide anode with enhanced cycling stabilization

  Author: Zheng, Guoxu; Deng, Yufeng; Ren, Mingyuan; Song, Mingxin

• Experimental study on the sorption performance of New-Fashioned silver getters compared with the traditional PdO in High-Vacuum multi-layer insulation vessels

  Author: Zhu, Ming; Yu, Yang; Huang, Qianghua; Li, Xiang; Gu, Chunlin; Zhang, Bo; Yao, Xin; Li, Zhaoting; Hao, Cungen

• Comparison of surface integrity of GH4169 superalloy after high-energy, low-energy, and femtosecond laser shock peening

  Author: Yu, Yanqing; Gong, Jianen; Fang, Xiuyang; Zhou, Longlong; He, Weifeng; Zhou, Liucheng; Cai, Zhenbing

英文介紹

Vacuum雜志英文介紹

Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.

A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.

The scope of the journal includes:

1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).

2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.

3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.

4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.